8 Station Semi-conductor Wafer Indexer
This system was designed specifically for ion-beam processing of 2″ or 3″ semi-conductor wafers at elevated temperatures. It consists of a tabletop furnace with a high precision DC power supply and indexing system.The indexing system allows precise control of the wafer position and permits batch processing of 8 wafers per run. The wafers are rotated to the heater and will be heated up in a matter of seconds before the ion-beam processing can commence. Temperature is controlled by an optical pyrometer reading the surface temperature of the heated wafer. A large access port allows attachment of the ion beam instrumentation. The furnace is a complete turn key system with a vacuum system, inert gas system, indexing servo controls , temperature controls and water cooling.

Parameter Name	Parameter Value
Number of axes	XY
Features	rotary, laser
Applications	vacuum for the semiconductor industry
Other characteristics	servo controlled