FluorOptic Temperature Converter for measurements between -200 to 450 °C in semiconductor applications.
The Luxtron® M-1000 is Advanced Energy’s newest FluorOptic® Thermometry (FOT) converter platform enabling accurate temperature measurement as low as -200 °C and up to 450 °C for advanced semiconductor applications in etch and deposition.
Advanced low-noise electronics and algorithms give precision better than 0.05 °C
AccuDisc™ sensors enable sensor to be separate from the probe enabling greater accuracy and repeatably
Experienced team to support custom probe development for OEMs
Compact, DIN-rail size to minimize footprint when integrated into tools and equipment
Advanced Energy’s Luxtron® FluorOptic Temperature (FOT) Sensors use the principles of phosphorescence to deliver high-accuracy temperature monitoring for critical semiconductor applications such as plasma etch and plasma enhanced deposition. The sensors are immune to interference from RF and microwave sources, enabling the sub-1 °C process control required to achieve device performance and yield for leading edge semiconductor devices.
The Luxtron M-1000 is the latest FOT converter platform, featuring an advanced light source and improved electronics for ultralow noise. In addition, two new proprietary phosphor formulations, VioLux™ and RubiLux™, have been developed to work in concert with the M-1000 to deliver sub-0.5 °C accuracy, repeatability, and stability over an extended range -200 to 450 °C (-328 to 842 °F). This extended temperature range enables both cryogenic and high temperature etch processes, both of which are critical for etching advanced high aspect ratio devices, such as 3D NAND.