With its unique optical design technology, the Imperia system detects and classifies yield-killing defects with the additional benefit of simultaneous state-of-the-art photoluminescence (PL) production monitoring.

Product Overview
With unique optical design technology, the Imperia system detects and classifies yield-killing defects with the additional benefit of simultaneous state-of-the-art photoluminescence (PL) production monitoring. Combining these two post-epitaxial metrology screening functions into a single high throughput system minimizes valuable fab space use and cassette handling time. This product can provide significant economic savings to the user (for example: accurately predicting MOCVD reactor yield and PM schedules).

• High density spectral PL mapping
• Defect analysis and classification
• Epitaxial layer thickness and normalized reflectivity imaging at high resolution
• Wafer shape profiling and 3D bow reconstruction

Parameter Name	Parameter Value
Technology	optical 3D photoluminescence
Operational mode	automated
Applications	for wafers
Type	for defect detection
Other characteristics	computer-controlled