29xx
Broadband Plasma Patterned Wafer Defect Inspection Systems

The 295x Series broadband plasma defect inspection systems provide advancements in optical defect inspection, enabling discovery of yield-critical defects on ≤7nm logic and leading-edge memory design nodes. Using enhanced broadband plasma illumination technology, and the new pixel•point™ and nano•cell™ design-aware technologies, the 2950 and 2955 broadband plasma defect inspectors provide the sensitivity required to capture critical defects across a range of process layers, material types and process stacks. As the industry-standard for inline monitoring, the 295x Series pairs sensitivity with optical wafer defect inspection speed, enabling Discovery at the Speed of Light™ – the combination of fast defect discovery and full characterization of defect issues at optimal cost of ownership.

Applications
Defect discovery, Hotspot discovery, Process debug, Engineering analysis, Line monitoring, Process window discovery

Parameter Name	Parameter Value
Technology	optical
Applications	for patterned wafers
Sector	for the electronics industry
Other characteristics	defect high-resolution