The Multiband plasma-process monitor C10346-01 is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multichannel recording in real-time.

Specifications
Type number : C10346-01
Wavelength range : 200 nm to 950 nm
Wavelength accuracy : ±0.75 nm
Wavelength resolution (FWHM) : <2 nm
Power supply : AC100 V to AC240 V (50 Hz/60 Hz)
Power consumption : Approx. 70 VA
Digital output terminal (Determinate signal output) : TTL maximum 5 channels (3 channels maximum when measurement trigger signal is used
Digital input terminal (starting measurement trigger signal) : TTL 1 channel Using TTL 5 channel
Digital output terminal (Busy signal) : TTL 1 channel Using TTL 4 channel
Analog output terminal : 2 channels 0 V to 10 V
Fiber probe connector : SMA
Communicate interface : USB 2.0 Type B
Ambient operating temperature : +10 ˚C to +30 ˚C

Parameter Name	Parameter Value
Applications	measurement process emissions plasma
Interface	USB 2.0
Other characteristics	digital real-time