New CD-SEM designed for sub-22nm technology node and beyond.

Advanced CD Measurement SEM CG5000 (HITACHI CD-SEM) delivers High-Resolution, High-Throughput and High-Repeatability by utilizing improved electron optics, advanced image processing and new wafer transfer system.
CG5000 is also capable of enhanced automatic calibration, providing long-term stability.
In addition, CD-SEM CG5000 has new applications and measurement techniques to be able to meet measurement challenges for new process and new materials for 1Xnm process development.

Parameter Name	Parameter Value
Technology	CD-SEM
Applications	for wafers
Other characteristics	measurement high-resolution high-throughput