Yield maximization in the smallest possible construction space
This high-precision positioning system has been specifically designed as a complementary polarization filter for miniaturization and automation in EUV lithography. It maximizes the exposure quality as well as the yield of an existing wafer stepper in a very limited space of about 120 x 180 x 31 mm. For this purpose, three independently positionable filters are shifted in the optical system's beam path.It can be used for high-resolution processes under extreme environmental conditions, such as EUV and a dry as well as oxygen-free pure nitrogen atmosphere.

Optimizing accuracy in extreme environments
• Ideal for miniaturization in automated EUV lithography
• Maximizes yield and resolution of existing wafer stepper systems in smallest space (approx. 120 x 180 x 31 mm)
• Accuracies up to 1.5 µm under most extreme environmental conditions: EUV, dry, oxygen-free pure nitrogen atmosphere
• Maintenance-free and flexible 24/7 operation over many 1,000 positioning cycles, distributed over 10 years

Optionally expandable:

• Different travels
• Material selection and vacuum lubrication adapted to the application
• Individual solutions for integration into the customer-specific application
• Version for clean room ISO 14644-1 (up to class 1 on request)

Parameter Name	Parameter Value
Number of axes	3-axis
Features	linear
Applications	for the semiconductor industry for wafer handling
Other characteristics	with DC motor high-resolution lead screw
Stroke (mm)	76 - 76
Speed (mm/s)	50 - 50